TY  - BOOK
AU  - Hosono, Kunihiro
ED  - BACUS (Technical group), Photomask Japan, SPIE (Society)
TI  - Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan
SN  - 9780819476562
SN  - 201028786
U1  - 621.381531 HOS 
PY  - 2009///
CY  - Bellingham, WA
PB  - SPIE
KW  - Integrated circuits - Masks - Congresses
KW  - Masks (Electronics) - Congresses
KW  - Microlithography - Congresses
KW  - Optoelectronic devices - Design and construction - Congresses
KW  - X-ray lithography - Congresses
N1  - Includes bibliographical references and author index
ER  -