Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan 
Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE 
 - Bellingham, WA  SPIE  c2009 
 - 1 v. (various pagings) : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819476562 
<br/><br/><label>ISSN: </label>2010287868 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Masks - Congresses<br/>Masks (Electronics) - Congresses<br/>Microlithography - Congresses<br/>Optoelectronic devices - Design and construction - Congresses<br/>X-ray lithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 HOS