Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan 
Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering 
 - Bellingham, WA  SPIE  c2004 
 - 2 v. (xxxiii, 984 p.) : ill. ; 28 cm 
<br/><br/> Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819453693 
<br/><br/><label>ISSN: </label>2005298703 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Masks - Congresses<br/>Masks (Electronics) - Congresses<br/>Microlithography - Congresses<br/>Optoelectronic devices - Design and construction - Congresses<br/>X-ray lithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 TAN