Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan 
Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) 
 - Bellingham, WA  SPIE  2006 
 - 2 v. : ill. ; 28 cm 
<br/><br/> Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819463586 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Masks - Congresses<br/>Masks (Electronics) - Congresses<br/>Microlithography - Congresses<br/>Optoelectronic devices - Design and construction - Congresses<br/>X-ray lithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 HOG