Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA 
Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc 
 - Bellingham, WA  SPIE  c2007 
 - 3 v. : ill. (some col. ) ; 28 cm 
<br/><br/> Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819466396 
<br/><br/><label>ISSN: </label>2010459315 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Masks - Congresses<br/>Manufacturing processes - Congresses<br/>Microlithography - Congresses<br/>X-ray lithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 FLA.1