TY  - BOOK
AU  - Allgair, John A
AU  - Raymond, Christopher J
ED  - International SEMATECH, SPIE (Society)
TI  - Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States
SN  - 9780819475251
U1  - 621.381548 ALL 
PY  - 2009///
CY  - Bellingham, WA
PB  - SPIE
KW  - Integrated circuits - Inspection - Congresses
KW  - Integrated circuits - Measurement - Congresses
KW  - Microlithography - Congresses
KW  - Process control - Congresses
N1  - Includes bibliographical references and index
ER  -