Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States 
John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) 
 - Bellingham, WA  SPIE  2009 
 - 2 v. : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819475251 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Inspection - Congresses<br/>Integrated circuits - Measurement - Congresses<br/>Microlithography - Congresses<br/>Process control - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381548 ALL