Lithography for semiconductor manufacturing II : 30 may-1 June, 2001, Edinburgh, UK 
Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK) 
 - Bellingham, WA  SPIE  c2001 
 - vii, 422 p. : ill. (some col.) ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819441058 
<br/><br/><label>ISSN: </label>2003268042 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Design and construction - Congresses<br/>Integrated circuits - Very large scale integration - Congresses<br/>Microlithography - Congresses<br/>Semiconductors - Etching - Congresses
<br/><br/><label>Dewey Class. No.: </label>670 MAC