EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado 
Carolyn A. MacDonald ... [et al.], chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering 
 - Bellingham, WA  SPIE  1999 
 - x, 394 p. : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819432537 
<br/><br/><label>ISSN: </label>710730 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Extreme ultraviolet lithography. - Congresses<br/>Ion beam lithography - Congresses<br/>Lithography, Electron beam - Congresses<br/>Neutron sources - Congresses<br/>X-ray optics - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.36 MAC