EMLC 2008 : 24th European mask and lithography conference : 21-24 January 2008, Dresden, Germany 
Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.] 
 - Bellingham, WA  SPIE  c2008 
 - 1 v. (various pagings) : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819469564 
<br/><br/><label>ISSN: </label>2010287113 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Masks - Congresses<br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.38173 BEH