TY  - BOOK
AU  - Lercel, Michael J
ED  - International SEMATECH, Society of Photo-optical Instrumentation Engineers
TI  - Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
SN  - 9780819461940
SN  - 200753325
U1  - 621.381531 LER 
PY  - 2006///
CY  - Bellingham, WA
PB  - SPIE
KW  - Lithography, Electron beam - Congresses
KW  - Masks (Electronics) - Congresses
KW  - Microlithography - Industrial applications - Congresses
KW  - X-ray lithography - Congresses
KW  - X-rays - Industrial applications - Congresses
N1  - Includes bibliographical references and author index
ER  -