Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA 
Alexander Starikov, Kenneth W. Tobin, Jr., chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering 
 - Bellingham, Wash  SPIE  c2002 
 - xv, 628 p. : ill. (some col.) ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819444394 
<br/><br/><label>ISSN: </label>2002512515 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Defects - Analysis - Congresses<br/>Integrated circuits - Design and construction - Congresses<br/>Microelectronics industry - Quality control - Congresses<br/>Quality control - Congresses<br/>Semiconductor wafers - Defects - Analysis - Congresses<br/>Semiconductors - Characterization - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.3672 STA