Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA 
Lars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH 
 - Bellingham, Wash  SPIE  c2005 
 - xxxv, 438 p. : ill. (some col.) ; 28 cm 
<br/><br/> Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819457363 
<br/><br/><label>ISSN: </label>2006272389 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Defects - Analysis - Congresses<br/>Integrated circuits - Design and construction - Congresses<br/>Microelectronics industry - Quality control - Congresses<br/>Quality control - Congresses<br/>Semiconductor wafers - Defects - Analysis - Congresses<br/>Semiconductors - Design and construction - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381 LIE