Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA 
Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH 
 - Bellingham, Wash  SPIE  c2004 
 - xxviii, 302 p. : ill., ports. ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819452924 
<br/><br/><label>ISSN: </label>2004303081 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Defects - Analysis - Congresses<br/>Integrated circuits - Design and construction - Congresses<br/>Microelectronics industry - Quality control - Congresses<br/>Quality control - Congresses<br/>Semiconductor wafers - Defects - Analysis - Congresses<br/>Semiconductors - Design and construction - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381 LIE