Borst, Christopher L <br/><br/>
Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology 
by Christopher L. Borst, William N. Gill, Ronald J. Gutmann 
 - Deventer, The Netherlands ; Boston, MA  Kluwer Academic Publishers  2002 
 - xiv, 229 p. : ill. ; 25 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9781402071935 
<br/><br/><label>ISSN: </label>2002028782 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemical mechanical planarization<br/>Grinding and polishing<br/>Interconnects (Integrated circuit technology)<br/>Semiconductors - Polishing
<br/><br/><label>Dewey Class. No.: </label>621.38152 BOR