Chemical vapour deposition : precursors, processes and applications 
edited by Anthony C. Jones, Michael L. Hitchman 
 - Cambridge  Royal Society of Chemistry  c2009 
 - xv, 582 p. : ill., plans ; 26 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780854044658 
<br/><br/><label>ISSN: </label>2009419379 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemical vapor deposition
<br/><br/><label>Dewey Class. No.: </label>671.735 JON