Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH

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Publication details: Bellingham, WA SPIE c2003Description: 2 v. (xxvii, 1248 p.) : ill. (some col.) ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 HER (Browse shelf(Opens below))	Available		277414
Anna Centenary Library	621.381531 HER (Browse shelf(Opens below))	Available		277415

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Includes bibliographical references and author index

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