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Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH

Contributor(s): Publication details: Bellingham, WA SPIE c1998Description: xv, 744 p. : ill. ; 28 cmISBN:
  • 9780819427779
ISSN:
  • 98226775
Subject(s): DDC classification:
  • 621.381531 SIN
Item type: Books
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