23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa / edited by Kurt R. Kimmel, Wolfgang Staud

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Language: English Series: Proceedings of SPIE--the International Society for Optical Engineering ; v. 5256Publication details: Bellingham Spie c2003Edition: 1st edDescription: xix, 700 p. : ill. ; 29 cmISBN:

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Item type	Current library	Call number	Status	Barcode
Reference	Anna Centenary Library 6TH FLOOR, B WING	621.381531 KIM (Browse shelf(Opens below))	Not for loan	276674

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Previous	621.38152 ROB Silicon-based And Hybrid Optoelectronics Iii : 23-24 January, 2001, San Jose, Usa	621.38152 WAN 2009 International Conference On Optical Instruments And Technology : Optical Systems And Modern Optoelectronic Instruments : 19-22 October 2009, Shanghai, China	621.381522 PAN Semiconductor Lasers And Laser Dynamics Iv : 12-16 April 2010, Brussels, Belgium	621.381531 KIM 23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa	621.381531 TAN Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan	621.382 KAD Signal Processing, Sensor Fusion, And Target Recognition Xii : 21-23 April, 2003, Orlando, Florida, Usa :	621.382 KAD Signal Processing, Sensor Fusion, And Target Recognition Xi : 1-2 April, 2002, Orlando, [Florida] Usa :	Next

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