Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan / edited by Hiroyoshi Tanabe

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Language: English Series: Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446Publication details: Bellingham Spie c2004Edition: 1st edDescription: xiii, 990 p. : ill. ; 28 cmISBN:

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Item type	Current library	Call number	Status	Barcode
Reference	Anna Centenary Library 6TH FLOOR, B WING	621.381531 TAN (Browse shelf(Opens below))	Not for loan	423512

Includes bibliographies and index

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