Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH

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Publication details: Bellingham, Wash SPIE c2004Description: 2 v. (xxxviii, 1288 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	686.2325 STU (Browse shelf(Opens below))	Available		276790
Anna Centenary Library	686.2325 STU (Browse shelf(Opens below))	Available		276791

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Includes bibliographical references and index

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