Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International

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Publication details: Bellingham, Wash SPIE c2003Description: 2 v. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 FED (Browse shelf(Opens below))	Available		276763
Anna Centenary Library	621.381531 FED (Browse shelf(Opens below))	Available		276764

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Includes bibliographical references and author index

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