Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International

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Publication details: Bellingham, Wash SPIE c2003Description: 2 v. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 FED (Browse shelf(Opens below))	Available		276763
Anna Centenary Library	621.381531 FED (Browse shelf(Opens below))	Available		276764

Includes bibliographical references and author index

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