Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

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Publication details: Bellingham, Wash SPIE c2001Description: 2 v. (xxix, 1084 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 HOU (Browse shelf(Opens below))	Available		278828

Includes bibliographical references and author index

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