Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

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Publication details: Bellingham, Wash SPIE c2002Description: 2 v. : ill. ; 28 cmISBN:

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Item type: Books

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.3815 FED (Browse shelf(Opens below))	Available		417469

Includes bibliographical references and index

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