Advanced microlithography technologies : 8-10 November, 2004, Beijing, China Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors, ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.]

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Publication details: Bellingham, Wash SPIE c2005Description: xi, 380 p. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 WAN (Browse shelf(Opens below))	Available		417517

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Previous	621.381531 THO Polymers for microelectronics : resists and dielectrics	621.381531 THO Introduction to microlithography	621.381531 VLA Emerging lithographic technologies III : 15-17 march, 1999, Santa Clara, California	621.381531 WAN Advanced microlithography technologies : 8-10 November, 2004, Beijing, China	621.381531 WEI Advanced processes for 193-nm immersion lithography	621.381531 WIL Build your own printed circuit board	621.381531 WU Extreme ultraviolet lithography	Next

Includes bibliographical references and author index

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