Photomask technology 2008 : 7-10 October 2008, Monterey, California, USA Hiroichi Kawahira, Larry S. Zurbrick, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE

Contributor(s):

Publication details: Bellingham, WA SPIE c2008Description: 2 v. : ill. ; 28 cmISBN:

9780819473554

ISSN:

2010537980

Subject(s):

DDC classification:

621.3815 KAW

Item type: Books

Tags from this library: No tags from this library for this title.

Average rating: 0.0 (0 votes)

Holdings
Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.3815 KAW (Browse shelf(Opens below))	Available		278103
Anna Centenary Library	621.3815 KAW (Browse shelf(Opens below))	Available		278104

Some earlier conferences have the title: Symposium on Photomask Technology, or the title: Annual BACUS Symposium on Photomask Technology, or the title: BACUS Symposium on Photomask Technology. Includes bibliographical references and author index

There are no comments on this title.

to post a comment.

Photomask technology 2008 : 7-10 October 2008, Monterey, California, USA Hiroichi Kawahira, Larry S. Zurbrick, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE

Find us on the map