Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

Contributor(s):

Publication details: Bellingham, WA SPIE c2006Description: (various pagings) : ill. (some col.) ; 28 cmISBN:

ISSN:

Subject(s):

DDC classification:

Item type: Books

Tags from this library: No tags from this library for this title.

Average rating: 0.0 (0 votes)

Holdings
Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 MAR (Browse shelf(Opens below))	Available		424520
Anna Centenary Library	621.381531 MAR (Browse shelf(Opens below))	Available		424521

Previous								Next
Previous	621.381531 LIN Advances in resist technology and processing XXIII 20-22 February, 2006, San Jose, California, USA	621.381531 MAC Fundamental principles of optical lithography : the science of microfabrication	621.381531 MAR Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA	621.381531 MAR Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA	621.381531 MIT Complete PCB design using ORCAD capture and PCB editor	621.381531 MON Printed circuit board design techniques for EMC compliance : a handbook for designers	621.381531 MOR Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan	Next

Includes bibliographical references and index

There are no comments on this title.

to post a comment.

Find us on the map