Photomask fabrication technology Benjamin G. Eynon, Jr., Banqiu Wu

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Publication details: New York McGraw-Hill 2005Description: xi, 571 p. : ill. ; 24 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 EYN (Browse shelf(Opens below))	Available		256261

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Previous	621.381531 DUS Optical microlithography XXIII : 23-25 February 2010, San Jose, California, United States	621.381531 ENG Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA	621.381531 ENG Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA	621.381531 EYN Photomask fabrication technology	621.381531 FED Advances in resist technology and processing XIX	621.381531 FED Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA	621.381531 FED Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA	Next

Includes bibliographical references and index

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