Photomask and x-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.]

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Publication details: Bellingham, WA SPIE c1999Description: xiii, 628 p. : ill. (some col.) ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.3815 MOR (Browse shelf(Opens below))	Available		278102

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Includes bibliographical references and index

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