Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE

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Publication details: Bellingham, WA SPIE c2009Description: 1 v. (various pagings) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 HOS (Browse shelf(Opens below))	Available		423566

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Previous	621.381531 HER Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States	621.381531 HOG Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan	621.381531 HOG Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan	621.381531 HOS Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan	621.381531 HOU Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA	621.381531 HU Modern semiconductor devices for integrated circuits	621.381531 HU Modern semiconductor devices for integrated circuits	Next

Includes bibliographical references and author index

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