Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering

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Publication details: Bellingham, WA SPIE c2005Description: 2 v. (xli, 1048 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.3815 KOM (Browse shelf(Opens below))	Available		278100
Anna Centenary Library	621.3815 KOM (Browse shelf(Opens below))	Available		278101

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

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