Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering

Contributor(s):

Publication details: Bellingham, WA SPIE c2004Description: 2 v. (xxxiii, 984 p.) : ill. ; 28 cmISBN:

ISSN:

Subject(s):

DDC classification:

Item type: Books

Tags from this library: No tags from this library for this title.

Average rating: 0.0 (0 votes)

Holdings
Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 TAN (Browse shelf(Opens below))	Available		423511
Anna Centenary Library	621.381531 TAN (Browse shelf(Opens below))	Available		423517

Previous								Next
Previous	621.381531 SUL Metrology, inspection, and process control for microlithography XV : 26 February-1 march, 2001, Santa Clara, [California] USA	621.381531 SUZ Microlithography : science and technology	621.381531 TAN Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan	621.381531 TAN Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan	621.381531 TAN Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan	621.381531 THO Polymers for microelectronics : resists and dielectrics	621.381531 THO Introduction to microlithography	Next

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

There are no comments on this title.

to post a comment.

Back to results

Find us on the map