Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering

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Publication details: Bellingham, WA SPIE c2004Description: 2 v. (xxxiii, 984 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 TAN (Browse shelf(Opens below))	Available		423511
Anna Centenary Library	621.381531 TAN (Browse shelf(Opens below))	Available		423517

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

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