Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering

Contributor(s):

Publication details: Bellingham, WA SPIE c2003Description: xxi, 1066 p. : ill. (some col.) ; 28 cmISBN:

ISSN:

Subject(s):

DDC classification:

Item type: Books

Tags from this library: No tags from this library for this title.

Average rating: 0.0 (0 votes)

Holdings
Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 TAN (Browse shelf(Opens below))	Available		278070

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

There are no comments on this title.

to post a comment.

Find us on the map