Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE

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Publication details: Bellingham, WA SPIE c2007Description: 3 v. : ill. (some col.) ; 28 cmISBN:

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Current library	Call number	Status	Barcode
Anna Centenary Library	621.36 NAB.6730 (Browse shelf(Opens below))	Available	423534
Anna Centenary Library	621.36 NAB.6730 (Browse shelf(Opens below))	Available	423535
Anna Centenary Library	621.36 NAB.6730 (Browse shelf(Opens below))	Available	423536

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Previous	621.36 MUS Optical materials : an introduction to selection and application	621.36 NAB Visual information processing VIII : 6 April 1999, Orlando, Florida	621.36 NAB.6730 Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA	621.36 NAB.6730 Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA	621.36 NAB.6730 Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA	621.36 NAS Applications of artificial neural networks in image processing IV : 28-29 January 1999, San Jose, California	621.36 NAT Nanophotonics : accessibility and applicability	Next

Some earlier conferences have title: Symposium on Photomask Technology. Includes bibliographical references and author index

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