Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan)

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Publication details: Bellingham, WA SPIE 2006Description: 2 v. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 HOG (Browse shelf(Opens below))	Available		424214
Anna Centenary Library	621.381531 HOG (Browse shelf(Opens below))	Available		424215

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Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

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