Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc

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Publication details: Bellingham, WA SPIE c2007Description: 3 v. : ill. (some col. ) ; 28 cmISBN:

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Current library	Call number	Status	Barcode
Anna Centenary Library	621.381531 FLA.1 (Browse shelf(Opens below))	Available	422988
Anna Centenary Library	621.381531 FLA.1 (Browse shelf(Opens below))	Available	422989
Anna Centenary Library	621.381531 FLA.1 (Browse shelf(Opens below))	Available	422990

Includes bibliographical references and author index

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