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Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH
Publication details: Bellingham, WA SPIE c2005Description: 3 v. : ill. (some col. ) ; 28 cmISBN:- 9780819457349
- 621.381531 SMI
| Current library | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|
| Anna Centenary Library | 621. 381531 SMI (Browse shelf(Opens below)) | Available | 423023 | ||
| Anna Centenary Library | 621. 381531 SMI (Browse shelf(Opens below)) | Available | 423024 | ||
| Anna Centenary Library | 621. 381531 SMI (Browse shelf(Opens below)) | Available | 423025 |
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| 621. 381531 LEV Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA | 621. 381531 LEV Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA | 621. 381531 SMI Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA | 621. 381531 SMI Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA | 621. 381531 SMI Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA | 621. 381532 AND Optimal filtering | 621. 381535 STA Operational amplifiers with linear integrated circuits |
Includes bibliographical references and author index
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