Metrology, inspection, and process control for microlithography XIII : 15-18 march, 1999, Santa Clara, California Bhanwar Singh, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

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Publication details: Bellingham, WA SPIE c1999Description: 2 v. (xv, 1052 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 SIN (Browse shelf(Opens below))	Available		277517
Anna Centenary Library	621.381531 SIN (Browse shelf(Opens below))	Available		277518

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Previous	621.381531 SCH Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States	621.381531 SCH Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States	621.381531 SIN Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California	621.381531 SIN Metrology, inspection, and process control for microlithography XIII : 15-18 march, 1999, Santa Clara, California	621.381531 SIN Metrology, inspection, and process control for microlithography XIII : 15-18 march, 1999, Santa Clara, California	621.381531 SOT Alternative lithography : unleashing the potentials of nanotechnology	621.381531 STE Flexible printed circuitry	Next

Includes bibliographical references and author index

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