Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH

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Publication details: Bellingham, WA SPIE 2004Description: 2 v. (xxxviii, 1110 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	686.2315 MAC (Browse shelf(Opens below))	Available		277003

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Previous	686.2315 KOH Advanced Lithography	686.2315 MAC Emerging lithographic technologies IX : 1-3 march 2005, San Jose, California, USA	686.2315 MAC Emerging lithographic technologies IX : 1-3 march 2005, San Jose, California, USA	686.2315 MAC Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA	686.2316 SIV எளிய முறையில் ஸ்கிரீன் பிரிண்டிங் : 25 பட விளக்கங்களுடன் wall paper தயாரிக்கும் முறைகளுடன்	686.2325 HOU Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA	686.2325 HOU Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA	Next

Includes bibliographical references and index

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