Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States Frank M. Schellenberg, Bruno M. La Fontaine, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc

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Publication details: Bellingham, Wash SPIE c2009-Description: 2 v. (various pagings) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 SCH (Browse shelf(Opens below))	Available		276772
Anna Centenary Library	621.381531 SCH (Browse shelf(Opens below))	Available		276773

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Previous	621.381531 SCH Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA	621.381531 SCH Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA	621.381531 SCH Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States	621.381531 SCH Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States	621.381531 SIN Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California	621.381531 SIN Metrology, inspection, and process control for microlithography XIII : 15-18 march, 1999, Santa Clara, California	621.381531 SIN Metrology, inspection, and process control for microlithography XIII : 15-18 march, 1999, Santa Clara, California	Next

Previous conference proceedings entitled: Emerging lithographic technologies. Includes bibliographical references and author index

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