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Advances in resist technology and processing XXIII 20-22 February, 2006, San Jose, California, USA Qinghuang Lin

By:

Lin, Quinghuang

Publication details: California The International Society 2006ISBN:

9780819461964

Subject(s):

Microlithography

DDC classification:

621.381531 LIN

Item type: Books

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Holdings ( 2 )
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Holdings
Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 LIN (Browse shelf(Opens below))	Available		417524
Anna Centenary Library	621.381531 LIN (Browse shelf(Opens below))	Available		417525

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Previous	621.381531 LER Emerging lithographic technologies XI 27 February-1 march 2007, San Jose, California, USA	621.381531 LEV Principles of lithography	621.381531 LIN Optical lithography : here is why	621.381531 LIN Advances in resist technology and processing XXIII 20-22 February, 2006, San Jose, California, USA	621.381531 LIN Advances in resist technology and processing XXIII 20-22 February, 2006, San Jose, California, USA	621.381531 MAC Fundamental principles of optical lithography : the science of microfabrication	621.381531 MAR Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA	Next

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