Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH

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Publication details: Bellingham, Wash SPIE c2007Description: 2 v. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381 DUP (Browse shelf(Opens below))	Available		276704
Anna Centenary Library	621.381 DUP (Browse shelf(Opens below))	Available		276705

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Previous conference proceedings entitled: Advances in resist technology and processing. Includes bibliographical references and author index

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