Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH

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Publication details: Bellingham, Wash SPIE c2007Description: 2 v. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381 DUP (Browse shelf(Opens below))	Available		276704
Anna Centenary Library	621.381 DUP (Browse shelf(Opens below))	Available		276705

Previous conference proceedings entitled: Advances in resist technology and processing. Includes bibliographical references and author index

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