Lithography for semiconductor manufacturing II : 30 may-1 June, 2001, Edinburgh, UK Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

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Publication details: Bellingham, WA SPIE c2001Description: vii, 422 p. : ill. (some col.) ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	670 MAC (Browse shelf(Opens below))	Available		423740

Includes bibliographical references and index

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