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Extreme ultraviolet lithography [edited by] Banqiu Wu, Ajay Kumar
Publication details: New York McGraw-Hill 2009Description: xiv, 465 p. : ill. ; 24 cmISBN:- 9780071549189
- 2009002187
- 621.381531 WU
| Current library | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|
| Anna Centenary Library | 621.381531 WU (Browse shelf(Opens below)) | Available | 255837 |
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| 621.381531 WAN Advanced microlithography technologies : 8-10 November, 2004, Beijing, China | 621.381531 WEI Advanced processes for 193-nm immersion lithography | 621.381531 WIL Build your own printed circuit board | 621.381531 WU Extreme ultraviolet lithography | 621.381531 YEN Optical microlithography XV : 5-8 march, 2002, Santa Clara, [California], USA | 621.381531 YEN Optical microlithography XV : 5-8 march, 2002, Santa Clara, [California], USA | 621.381531 ZUR Photomask technology 2009 : 14-17 September 2009, Monterey, California, United States |
Includes bibliographical references and index
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