EMLC 2007 : 23rd European mask and lithography conference : 22-25 January 2007, Grenoble, France Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, CEA-LETI (France) ... [et al.] ; published by SPIE--the International Society for Optical Engineering

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Publication details: Bellingham, WA SPIE c2007Description: 1 v. (various pagings) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.3815 BEH (Browse shelf(Opens below))	Available		276659

Includes bibliographical references and author index

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