Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA)

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Publication details: Bellingham, WA SPIE c2006Description: 2 v. : ill. (some col.) ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 LER (Browse shelf(Opens below))	Available		277028
Anna Centenary Library	621.381531 LER (Browse shelf(Opens below))	Available		277029

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Includes bibliographical references and author index

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