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Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH
Publication details: Bellingham, Wash SPIE c2004Description: xxx, 248 p. : ill. ; 28 cmISBN:- 9780819452917
- 2004303114
- 660.2815 TOB
| Current library | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|
| Anna Centenary Library | 660.2815 TOB (Browse shelf(Opens below)) | Available | 417639 |
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| 660.2815 SMI Advanced process control : beyond single-loop control | 660.2815 SPE Process technology systems | 660.2815 THO Process technology troubleshooting | 660.2815 TOB Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA | 660.2815 ULL.1 Ullmann's processes and process engineering | 660.2815 ULL.2 Ullmann's processes and process engineering | 660.2815 ULL.3 Ullmann's processes and process engineering |
Includes bibliographical references and index
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